Effects of Methyl Terminal and Carbon Bridging Groups Ratio on Critical Properties of Porous Organosilicate Glass Films

被引:20
作者
Vishnevskiy, Alexey S. [1 ]
Naumov, Sergej [2 ]
Seregin, Dmitry S. [1 ]
Wu, Yu-Hsuan [3 ]
Chuang, Wei-Tsung [4 ]
Rasadujjaman, Md [5 ,6 ]
Zhang, Jing [5 ]
Leu, Jihperng [3 ]
Vorotilov, Konstantin A. [1 ]
Baklanov, Mikhail R. [1 ,5 ]
机构
[1] MIREA Russian Technol Univ RTU MIREA, Res & Educ Ctr Technol Ctr, Moscow 119454, Russia
[2] Leibniz Inst Surface Engn IOM, D-04318 Leipzig, Germany
[3] Natl Chiao Tung Univ, Dept Mat Sci & Engn, Hsinchu 30049, Taiwan
[4] Natl Synchrotron Radiat Res Ctr, Hsinchu 30076, Taiwan
[5] North China Univ Technol, Dept Microelect, Beijing 100144, Peoples R China
[6] Dhaka Univ Engn & Technol, Dept Phys, Gazipur 1707, Bangladesh
基金
俄罗斯基础研究基金会; 中国国家自然科学基金;
关键词
organosilicate glass; low-k films; carbon bridges; pore structure; ellipsometric porosimetry; FTIR; density functional theory (DFT); Young’ s modulus; pore morphology; GISAXS; LOW DIELECTRIC-CONSTANT; METHYLTRIMETHOXYSILANE; CONDENSATION; POROSITY;
D O I
10.3390/ma13204484
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Organosilicate glass-based porous low dielectic constant films with different ratios of terminal methyl to bridging organic (methylene, ethylene and 1,4-phenylene) groups are spin-on deposited by using a mixture of alkylenesiloxane with organic bridges and methyltrimethoxysilane, followed by soft baking at 120-200 degrees C and curing at 430 degrees C. The films' porosity was controlled by using sacrificial template BrijL4. Changes of the films' refractive indices, mechanical properties, k-values, porosity and pore structure versus chemical composition of the film's matrix are evaluated and compared with methyl-terminated low-k materials. The chemical resistance of the films to annealing in oxygen-containing atmosphere is evaluated by using density functional theory (DFT). It is found that the introduction of bridging groups changes their porosity and pore structure, increases Young's modulus, but the improvement of mechanical properties happens simultaneously with the increase in the refractive index and k-value. The 1,4-phenylene bridging groups have the strongest impact on the films' properties. Mechanisms of oxidative degradation of carbon bridges are studied and it is shown that 1,4-phenylene-bridged films have the highest stability. Methylene- and ethylene-bridged films are less stable but methylene-bridged films show slightly higher stability than ethylene-bridged films.
引用
收藏
页码:1 / 21
页数:21
相关论文
共 47 条
[1]   Toward reliable density functional methods without adjustable parameters: The PBE0 model [J].
Adamo, C ;
Barone, V .
JOURNAL OF CHEMICAL PHYSICS, 1999, 110 (13) :6158-6170
[2]  
[Anonymous], 2017, JAG VERS 9 6 SOFTW T
[3]  
[Anonymous], 2018, DAT KNOWITALL INF SY
[4]  
[Anonymous], **NON-TRADITIONAL**
[5]  
Asefa T, 2000, ANGEW CHEM INT EDIT, V39, P1808, DOI 10.1002/(SICI)1521-3773(20000515)39:10<1808::AID-ANIE1808>3.0.CO
[6]  
2-G
[7]   Advanced Interconnects: Materials, Processing, and Reliability [J].
Baklanov, Mikhail R. ;
Adelmann, Christoph ;
Zhao, Larry ;
De Gendt, Stefan .
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2015, 4 (01) :Y1-Y4
[8]   Plasma processing of low-k dielectrics [J].
Baklanov, Mikhail R. ;
de Marneffe, Jean-Francois ;
Shamiryan, Denis ;
Urbanowicz, Adam M. ;
Shi, Hualiang ;
Rakhimova, Tatyana V. ;
Huang, Huai ;
Ho, Paul S. .
JOURNAL OF APPLIED PHYSICS, 2013, 113 (04)
[9]   Determination of pore size distribution in thin films by ellipsometric porosimetry [J].
Baklanov, MR ;
Mogilnikov, KP ;
Polovinkin, VG ;
Dultsev, FN .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (03) :1385-1391
[10]   Non-destructive characterisation of porous low-k dielectric films [J].
Baklanov, MR ;
Mogilnikov, KP .
MICROELECTRONIC ENGINEERING, 2002, 64 (1-4) :335-349