Ion beam-stimulated phase formation in fused silica

被引：0

作者：

Deshkovskaya, A

Richter, E

Komar, V

机构：

[1] Natl Inst Educ, Minsk, BELARUS

[2] Inst Ionenstrahlphys & Mat Forsch FZR, Rossendorf, Germany

[3] Inst Atom & Mol Phys, Minsk, BELARUS

来源：

SURFACE & COATINGS TECHNOLOGY | 2002年 / 158卷

关键词：

phase formation; glasses; ion synthesis;

D O I：

10.1016/S0257-8972(02)00291-8

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Phase formation involving implanted impurities is a most important ion beam-stimulated process in solids since it leads to formation of layer with different properties in glasses. In initial quartz glasses, new phases of mNa(2)O-nSiO(2) and mLi(2)O-nSiO(2) were produced at different depths from the surface. It was found that these ion-synthesized glasses and glasses of the same elemental composition obtained by conventional methods are structurally similar. The effect of ion beam-stimulated liquidation was found for the first time in ion-implanted glasses. The size of liquidation microphases is in the range 100-2000 Angstrom. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：508 / 512

页数：5