Direct evidence for selective impurity incorporation at the crystal domain boundaries in epitaxial ZnO layers

被引:13
作者
Bertram, F [1 ]
Forster, D [1 ]
Christen, J [1 ]
Oleynik, N [1 ]
Dadgar, A [1 ]
Krost, A [1 ]
机构
[1] Univ Magdeburg, Inst Phys Expt, D-39106 Magdeburg, Germany
关键词
D O I
10.1063/1.1791746
中图分类号
O59 [应用物理学];
学科分类号
摘要
A direct correlation of structural properties with the spatial distribution of bound exciton luminescence in ZnO epitaxial layers has been achieved on a microscopic scale using highly spatially and spectrally resolved cathodoluminescence. The morphology of the high quality ZnO layer is characterized by a distinct domain structure. While the laterally integrated cathodoluminescence spectrum shows narrow (full width at half maximum <3 meV) I-8 luminescence, a pronounced emission line at I-0/I-1 emerges in the local spectra taken at domain boundaries. In complete contrast, no I-0/I-1 emission is found inside the domains. Monochromatic images further evidence the selective incorporation of impurities at the grain boundaries of domains. Micro mappings of the I-8 peak wavelength directly visualize the strain relaxation across the domains toward their very center, where a drop in quantum efficiency indicates enhanced defect concentration. (C) 2004 American Institute of Physics.
引用
收藏
页码:1976 / 1978
页数:3
相关论文
共 14 条
  • [1] Strain relaxation and strong impurity incorporation in epitaxial laterally overgrown GaN: Direct imaging of different growth domains by cathodoluminescence microscopy and micro-Raman spectroscopy
    Bertram, F
    Riemann, T
    Christen, J
    Kaschner, A
    Hoffmann, A
    Thomsen, C
    Hiramatsu, K
    Shibata, T
    Sawaki, N
    [J]. APPLIED PHYSICS LETTERS, 1999, 74 (03) : 359 - 361
  • [2] Strong morphological dependence of luminescence efficiency and emission wavelength in hexagonal GaN crystallites directly imaged by scanning cathodoluminescence microscopy
    Bertram, F
    Christen, J
    Schmidt, M
    Topf, M
    Koymov, S
    Fischer, S
    Meyer, B
    [J]. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1997, 50 (1-3): : 165 - 169
  • [3] Direct imaging of local strain relaxation along the {1(1)under-bar01} side facets and the edges of hexagonal GaN pyramids by cathodoluminescence microscopy
    Bertram, F
    Christen, J
    Schmidt, M
    Hiramatsu, K
    Kitamura, S
    Sawaki, N
    [J]. PHYSICA E, 1998, 2 (1-4): : 552 - 556
  • [4] Plasma assisted molecular beam epitaxy of ZnO on c-plane sapphire: Growth and characterization
    Chen, YF
    Bagnall, DM
    Koh, HJ
    Park, KT
    Hiraga, K
    Zhu, ZQ
    Yao, T
    [J]. JOURNAL OF APPLIED PHYSICS, 1998, 84 (07) : 3912 - 3918
  • [5] SCANNING CATHODOLUMINESCENCE MICROSCOPY - A UNIQUE APPROACH TO ATOMIC-SCALE CHARACTERIZATION OF HETEROINTERFACES AND IMAGING OF SEMICONDUCTOR INHOMOGENEITIES
    CHRISTEN, J
    GRUNDMANN, M
    BIMBERG, D
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (04): : 2358 - 2368
  • [6] A two-step metal organic vapor phase epitaxy growth method for high-quality ZnO on GaN/Al2O3 (0001)
    Dadgar, A
    Oleynik, N
    Forster, D
    Deiter, S
    Witek, H
    Bläsing, J
    Bertram, F
    Krtschil, A
    Diez, A
    Christen, J
    Krost, A
    [J]. JOURNAL OF CRYSTAL GROWTH, 2004, 267 (1-2) : 140 - 144
  • [7] ACCEPTOR-EXCITON COMPLEXES IN ZNO - A COMPREHENSIVE ANALYSIS OF THEIR ELECTRONIC STATES BY HIGH-RESOLUTION MAGNETO-OPTICS AND EXCITATION SPECTROSCOPY
    GUTOWSKI, J
    PRESSER, N
    BROSER, I
    [J]. PHYSICAL REVIEW B, 1988, 38 (14): : 9746 - 9758
  • [8] Recent advances in ZnO materials and devices
    Look, DC
    [J]. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2001, 80 (1-3): : 383 - 387
  • [9] Bound exciton and donor-acceptor pair recombinations in ZnO
    Meyer, BK
    Alves, H
    Hofmann, DM
    Kriegseis, W
    Forster, D
    Bertram, F
    Christen, J
    Hoffmann, A
    Strassburg, M
    Dworzak, M
    Haboeck, U
    Rodina, AV
    [J]. PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS, 2004, 241 (02): : 231 - 260
  • [10] Metal organic vapor phase epitaxy of ZnO on GaN/Si(111) using tertiary-butanol as O-precursor
    Oleynik, N
    Dadgar, A
    Bläsing, J
    Adam, M
    Krtschil, A
    Forster, D
    Bertram, F
    Diez, A
    Seip, M
    Greiling, A
    Christen, J
    Krost, A
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2003, 42 (12): : 7474 - 7477