High uniformity collimator for x-ray proximity lithography

被引：0
|
作者：
Cash, W [1 ]
机构：
[1] Xmetr Inc, Boulder, CO USA
来源：
EUV, X-RAY, AND NEUTRON OPTICS AND SOURCES | 1999年 / 3767卷
关键词：
x-ray collimators; x-ray lithography; x-ray optics;
D O I：
10.1117/12.371142
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
An x-ray optic suitable for use in x-ray proximity lithography is described. It employs multiple flat mirror facets arranged at grazing incidence, each of which creates an optically independent channel that covers the entire target. The facets are arranged so that many channels can simultaneously illuminate the target, thereby achieving high flux at the target with high uniformity. Lithographic constraints on local and global divergence at the mask are met by making the optic small and placing it sufficiently distant from the target.
引用
收藏
页码：59 / 66
页数：8
相关论文
共 50 条
  • [21] Overlay and critical dimension control in proximity x-ray lithography
    Fujii, K.
    Tanaka, Y.
    Suzuki, K.
    Iwamoto, T.
    Tsuboi, S.
    Matsui, Y.
    NEC Research and Development, 2001, 42 (01): : 27 - 31
  • [22] Extendibility of proximity x-ray lithography to 25 nm and below
    Toyota, E
    Washio, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (06): : 2979 - 2983
  • [23] Mask-error factor in proximity x-ray lithography
    Fujii, K
    Suzuki, K
    Matsui, Y
    MICROPROCESSES AND NANOTECHNOLOGY 2000, DIGEST OF PAPERS, 2000, : 58 - 59
  • [24] Proximity-gated X-ray framing camera with gain uniformity
    Fu, W.
    Long, J.
    Cai, H.
    Liu, J.
    JOURNAL OF INSTRUMENTATION, 2021, 16 (06)
  • [25] Up-to-date activities of PXL (proximity X-ray lithography)
    Matsui, Y
    Taguchi, T
    Nakayama, Y
    Kikuchi, Y
    Tsuboi, S
    Sumitani, H
    PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY VIII, 2001, 4409 : 641 - 649
  • [26] Analysis of resist LER for the patterns replicated by proximity x-ray lithography
    Kikuchi, Y
    Taguchi, T
    Matsunaga, H
    MICROPROCESSES AND NANOTECHNOLOGY 2001, DIGEST OF PAPERS, 2001, : 268 - 269
  • [27] 50 nm pattern printing by narrowband proximity X-ray lithography
    Watanabe, Hiroshi
    Marumoto, Kenji
    Sumitani, Hiroaki
    Yabe, Hideki
    Kise, Koji
    Itoga, Kenji
    Aya, Sunao
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2002, 41 (12): : 7550 - 7555
  • [28] Magnification correction by changing wafer temperature in proximity x-ray lithography
    Aoyama, H
    Mitsui, S
    Taguchi, T
    Tanaka, Y
    Matsui, Y
    Fukuda, M
    Suzuki, M
    Haga, T
    Morita, H
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (06): : 3411 - 3414
  • [29] 50 nm pattern printing by narrowband proximity X-ray lithography
    Watanabe, H
    Marumoto, K
    Sumitani, H
    Yabe, H
    Kise, K
    Itoga, K
    Aya, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (12): : 7550 - 7555
  • [30] SLITLESS X-RAY COLLIMATOR
    MINGAZIN, TA
    ZELENOV, VI
    LEIKIN, VN
    INSTRUMENTS AND EXPERIMENTAL TECHNIQUES, 1981, 24 (01) : 244 - 246
12345