E→H mode transition density and power in two types of inductively coupled plasma configuration

被引:25
作者
Wang, Jian [1 ]
Du, Yin-chang [1 ]
Zhang, Xiao [1 ]
Zheng, Zhe [1 ]
Liu, Yu [1 ]
Xu, Liang [1 ]
Wang, Pi [1 ]
Cao, Jin-xiang [1 ]
机构
[1] Univ Sci & Technol China, Dept Modern Phys, Hefei 230026, Anhui, Peoples R China
关键词
LOW-FREQUENCY; H TRANSITION; PLANAR COIL; DISCHARGE; HYSTERESIS;
D O I
10.1063/1.4886147
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
E -> H transition power and density were investigated at various argon pressures in inductively coupled plasma (ICP) in a cylindrical interlaid chamber. The transition power versus the pressure shows a minimum transition power at 4 Pa (nu/omega = 1) for argon. Then the transition density hardly changes at low pressures (nu/omega << x 1), but it increases clearly when argon pressure exceeds an appropriate value. In addition, both the transition power and transition density are lower in the re-entrant configuration of ICP compared with that in the cylindrical configuration of ICP. The result may be caused from the decrease of stochastic heating in the re-entrant configuration of ICP. This work is useful to understand E -> H mode transition and control the transition points in real plasma processes. (C) 2014 AIP Publishing LLC.
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收藏
页数:5
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