Improvement of properties of TiN coating by optimising microstructural design

被引:19
作者
Ji, J. [1 ]
Niu, Y. [2 ]
Wu, J. [1 ]
Yu, Z. [2 ]
机构
[1] Jiangsu Univ, Sch Mat Sci & Engn, Zhenjiang 212013, Peoples R China
[2] Chinese Acad Sci, Inst Met Res, State Key Lab Corros & Protect, Shenyang 110016, Peoples R China
基金
国家高技术研究发展计划(863计划);
关键词
Adhesion; Wear; Multilayered TiN; Microstructure; ADHESION PERFORMANCE; HARDNESS; FILMS; RESISTANCE; CORROSION; STRESS; STEEL;
D O I
10.1179/1743294413Y.0000000177
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Multilayered TiN coating, with a microstructure of stackered up sandwiches, was successfully prepared by hollow cathode discharge method. The columnar epitaxial growth was obviously suppressed by introduction of the multilayered microstructure in the coating. The adhesion and wear resistance of the multilayered TiN coating was compared with those of the conventional TiN coating. The adhesion of the TiN coating to the substrate and the wear resistance of the TiN coating are obviously improved by optimising structural design. The multilayered microstructure of the coating piles up the dislocations and also inhibits the bulk flaking behaviour. The wear mechanism of the multilayered TiN coating is the microarea detachment.
引用
收藏
页码:36 / 40
页数:5
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