THE MORPHOLOGY AND STRUCTURE OF ZnO THIN FILMS DEPOSITED BY ALD METHOD

被引：0
|
作者：
Borylo, P. [1 ]
Matus, K. [1 ]
Lukaszkowicz, K. [1 ]
Golombek, K. [1 ]
机构：
[1] Silesian Tech Univ, Inst Engn Mat & Biomat, Ul Akad 2A, PL-04100 Gliwice, Poland
来源：
ARCHIVES OF METALLURGY AND MATERIALS | 2018年 / 63卷 / 01期
关键词：
ALD; ZnO; SEM; TEM; UV/VIS;
D O I：
10.24425/118919
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
This paper presents research results of zinc oxide thin films deposited on a glass substrate with use of ALD method. Our researches focused on analyzing of the influence of ALD deposition process temperature on the morphology and transparency of thin layers. The morphology was examined using both scanning and transmission electron microscopes. Transparency study was performed by UV-VIS spectroscopy. For our experiments, two sets of the coating have been prepared, differing in temperature and number of cycle used during the preparation process. The first set was deposited in 100 cycles, second one in 500 cycles. Each set of tested coating contained samples prepared at different temperatures.
引用
收藏
页码：129 / 133
页数：5
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