KTa0.6Nb0.4O3 ferroelectric thin film behavior at microwave frequencies for tunable applications

被引:28
作者
Laur, Vincent [1 ]
Rousseau, Anthony
Tanne, Gerard
Laurent, Paul
Deputier, Stephanie
Guilloux-Viry, Maryline
Huret, Fabrice
机构
[1] CNRS, LEST, UBO, ENSTBr,UMR 6165, F-29238 Brest 3, France
[2] Univ Rennes 1, CNRS, Unite Sci Chim Rennes, UMR 6226, F-35042 Rennes, France
关键词
D O I
10.1109/TUFFC.2006.174
中图分类号
O42 [声学];
学科分类号
070206 ; 082403 ;
摘要
In this study about the relationships between structural and microwave electrical properties of KTa1-xNbxO3 (KTN) ferroelectric materials, a KTN thin film was deposited on different substrates to investigate how KTN growth affects the microwave behavior. Interdigital capacitors and stubs were made on these films through a simple engraving process. Microwave measurements under a static electric field showed the importance of the substrate on the circuit behavior and, notably, on the tuning factor.
引用
收藏
页码:2280 / 2286
页数:7
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