Critical casimir force in 4He films:: Confirmation of finite-size scaling

被引:108
作者
Ganshin, A.
Scheidemantel, S.
Garcia, R.
Chan, M. H. W.
机构
[1] Penn State Univ, Dept Phys, University Pk, PA 16802 USA
[2] Worcester Polytech Inst, Dept Phys, Worcester, MA 01609 USA
基金
美国国家航空航天局;
关键词
FLUCTUATION-INDUCED FORCES; SUPERFLUID TRANSITION; LAMBDA-TRANSITION; PLANAR GEOMETRY; HEAT-CAPACITY; LIQUID-HELIUM; 2ND SOUND; POINT; MIXTURES; FRACTION;
D O I
10.1103/PhysRevLett.97.075301
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We present new capacitance measurements of critical Casimir force-induced thinning of He-4 films near the superfluid transition, focused on the region below T-lambda where the effect is the greatest. He-4 films of 238, 285, and 340 angstrom thickness are adsorbed on atomically smooth, N-doped silicon substrates. The Casimir force scaling function theta, deduced from the thinning of these three films, collapses onto a single universal curve, attaining a minimum theta=-1.30 +/- 0.03 at x=td(1/nu)=-9.7 +/- 0.8 angstrom(1/nu). The collapse confirms the finite-size scaling origin of the dip in the film thickness. Separately, we also confirm the presence down to 2.13 K of the Goldstone or surface fluctuation force, which makes the superfluid film similar to 2 angstrom thinner than the normal film.
引用
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页数:4
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