Structural Instability of Epitaxial (001) BiFeO3 Thin Films under Tensile Strain

被引:28
作者
Fan, Zhen [1 ]
Wang, John [1 ]
Sullivan, Michael B. [2 ]
Huan, Alfred [2 ]
Singh, David J. [3 ]
Ong, Khuong P. [2 ]
机构
[1] Natl Univ Singapore, Dept Mat Sci & Engn, Singapore 117576, Singapore
[2] ASTAR, Inst High Performance Comp, Singapore 138632, Singapore
[3] Oak Ridge Natl Lab, Mat Sci & Technol Div, Oak Ridge, TN 37831 USA
关键词
POLARIZATION; PHASE; DIFFRACTION; NANBO3;
D O I
10.1038/srep04631
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
We explore BiFeO3 under tensile strain using first-principles calculations. We find that the actual structures are more complex than what had been previously thought, and that there is a strong shear deformation type structural instability which modifies the properties. Specifically, we find that normal tensile strain leads to structural instabilities with a large induced shear deformation in (001) BiFeO3 thin films. These induced shear deformations in (001) BiFeO3 thin films under tension stabilize the (001) BiFeO3 thin films and lead to Cc and Ima2 phases that are more stable than the Pmc2(1) phase at high tensile strain. The induced shear deformation shifts the Cc to Ima2 phase transition towards lower tensile strain region (similar to 1% less), prevents monoclinic tilt and oxygen octahedral tilts, and increases the ferroelectric polarization. The induced shear deformation also strongly affects the electronic structure. The results are discussed in relation to growth of BiFeO3 thin films on cubic and tetragonal substrates involving high levels of tensile strain.
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页数:6
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