Development of an energetic ion assisted mixing and deposition process for TINx and diamondlike carbon films, using a co-axial geometry in plasma source ion implantation

Plasma source ion implantation (PSII) is a relatively simple technique for the ion implantation/deposition of materials. In PSII a substrate is immersed in a plasma, and high negative voltage pulses are applied to accelerate ions into the substrate resulting in modification of the properties of the material in the near surface region. A technique was developed to produce uniform diamondlike carbon coatings and TiNx films inside and outside a hollow cylinder (substrate). A description of apparatus, experimental methods for this type of deposition process, and preliminary results are presented in this article. (C) 1997 American Vacuum Society. [S0734-2101(97)03206-5].