Preparation of single phase tungsten carbide by annealing of sputtered tungsten-carbon layers

被引:40
作者
Romanus, H
Cimalla, V
Schaefer, JA
Spiess, L
Ecke, G
Pezoldt, J
机构
[1] Tech Univ Ilmenau, Inst Phys, D-98684 Ilmenau, Germany
[2] Tech Univ Ilmenau, Inst Werkstofftech, D-98684 Ilmenau, Germany
[3] Tech Univ Ilmenau, Inst Festkorperelekt, D-98684 Ilmenau, Germany
关键词
carbides; metallization; phase transition; tungsten;
D O I
10.1016/S0040-6090(99)00732-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Tungsten carbide layers were prepared by sputtering from a stoichiometric WC target and subsequent annealing. Carbide formation was found at temperatures above 800 degrees C. Annealing in pure hydrogen ambient results in a carbon depletion in the layers and the formation of a dominant W2C phase. We demonstrate that propane added to the annealing ambient stimulates a transformation of the tungsten-carbon layers to a stoichiometric WC phase. The variation of the propane concentration allows a continuously alteration of the layer structure between single phase WC and a mixed layer with dominant W2C and the adjustment of different values of the electrical resistance and the optical constants. (C) 2000 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:146 / 149
页数:4
相关论文
共 19 条
  • [1] BACHLI A, 1994, MATER RES SOC SYMP P, V339, P247, DOI 10.1557/PROC-339-247
  • [2] Barin I., 2008, Thermochemical Data of Pure Substances, VThird
  • [4] GROWTH OF THIN BETA-SIC LAYERS BY CARBONIZATION OF SI SURFACES BY RAPID THERMAL-PROCESSING
    CIMALLA, V
    KARAGODINA, KV
    PEZOLDT, J
    EICHHORN, G
    [J]. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1995, 29 (1-3): : 170 - 175
  • [5] Cottrell A. H., 1995, CHEM BONDING TRANSIT, P77
  • [6] EHRHARDT H, 1990, NATO ADV SCI I B-PHY, V220, P251
  • [7] TUNGSTEN AND TUNGSTEN-CARBON THIN-FILMS DEPOSITED BY MAGNETRON SPUTTERING
    GOUYPAILLER, P
    PAULEAU, Y
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (01): : 96 - 102
  • [8] CORRELATION OF PARTICLE-FLUX PARAMETERS WITH THE PROPERTIES OF THIN TUNGSTEN CARBIDE FILMS
    KELLER, G
    BARZEN, I
    DOTTER, W
    ERZ, R
    ULRICH, S
    JUNG, K
    EHRHARDT, H
    [J]. MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1991, 139 : 137 - 143
  • [9] CRYSTAL-STRUCTURE, MORPHOLOGY AND COMPOSITION OF MAGNETRON SPUTTERED TUNGSTEN CARBIDE FILMS
    KELLER, G
    BARZEN, I
    ERZ, R
    DOTTER, W
    ULRICH, S
    JUNG, K
    EHRHARDT, H
    [J]. FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY, 1991, 341 (5-6): : 349 - 352
  • [10] LEITZ G, 1993, MATER RES SOC SYMP P, V303, P171, DOI 10.1557/PROC-303-171