Alignment of mesostructured silica on a Langmuir-Blodgett film

被引：0
|
作者：
Miyata, H
Kuroda, K
机构：
[1] Canon Inc, R&D Headquarters, Canon Res Ctr, Atsugi, Kanagawa 2430193, Japan
[2] Waseda Univ, Dept Appl Chem, Shinjuku Ku, Tokyo 1698555, Japan
[3] Waseda Univ, Kagami Mem Lab Mat Sci & Technol, Shinjuku Ku, Tokyo 1690051, Japan
来源：
ADVANCED MATERIALS | 1999年 / 11卷 / 17期
关键词：
D O I：
10.1002/(SICI)1521-4095(199912)11:17<1448::AID-ADMA1448>3.0.CO;2-U
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
[No abstract available]
引用
收藏
页码：1448 / 1452
页数：5
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