Submicron-scale spatial feature of ultrafast photoinduced magnetization reversal in TbFeCo thin film

被引：62

作者：

Ogasawara, T. ^{[1
]}

Iwata, N. ^{[3
]}

Murakami, Y. ^{[3
]}

Okamoto, H. ^{[1
,4
]}

Tokura, Y. ^{[1
,2
]}

机构：

[1] Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki 3058562, Japan

[2] Univ Tokyo, Dept Appl Phys, Tokyo 1138656, Japan

[3] Sharp Co Ltd, Adv Technol Res Labs, Tenri, Nara 6328567, Japan

[4] Univ Tokyo, Dept Adv Mat Sci, Kashiwa, Chiba 2778561, Japan

来源：

APPLIED PHYSICS LETTERS | 2009年 / 94卷 / 16期

关键词：

cobalt alloys; high-speed optical techniques; iron alloys; Kerr magneto-optical effect; magnetic domains; magnetic thin films; magnetisation reversal; metallic thin films; photomagnetic effect; terbium alloys; time resolved spectra; NICKEL;

D O I：

10.1063/1.3123256

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Submicron-scale spatial feature of magnetization reversal dynamics induced by femtosecond optical pulse irradiation in a small external magnetic field was investigated by time-resolved magneto-optical Kerr microscopy on TbFeCo thin film. The magnetization reversal time near the magnetic domain boundary is dominated by an effective magnetic field generated from the peripheral domain by dipole-dipole interaction. The magnetization reversal is accelerated as high as 4.5 times (from 3.4 ns to 750 ps) when reducing the reversed domain size from 1.5 to 0.4 mu m due to concentration of dipole-dipole interaction.

引用

页数：3

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