The charge of micro-particles in a low pressure spatial plasma afterglow

被引：38

作者：

van Minderhout, B. ^{[1
]}

Peijnenburg, T. ^{[2
]}

Blom, P. ^{[2
]}

Vogels, J. M. ^{[2
]}

Kroesen, G. M. W. ^{[1
]}

Beckers, J. ^{[1
]}

机构：

[1] Eindhoven Univ Technol, Dept Appl Phys, POB 513, NL-5600 MB Eindhoven, Netherlands

[2] VDL Enabling Technol Grp, POB 80038, NL-5600 JW Eindhoven, Netherlands

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 2019年 / 52卷 / 32期

关键词：

plasma-assisted contamination control; dusty plasma; charge measurement; spatial afterglow; DUSTY PLASMA; PARTICLES; SHEATH; GRAIN;

D O I：

10.1088/1361-6463/ab2525

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

In this letter, we present charge measurements of micro-particles in the spatial afterglow (remote plasma) of an inductively coupled low pressure radiofrequency plasma. The particle afterglow charge of (-30 +/- 7) e, being deducted from their acceleration in an externally applied electric field, is about three orders of magnitude lower compared to the typical charge expected in the bulk of such plasmas. This difference is explained by a relatively simplistic analytical model applying orbital motion limited theory in the afterglow region. From an application perspective, our results enable further understanding and development of in situ plasma-based particle contamination control for ultra-clean low pressure environments.

引用

页数：6

共 38 条

[1] Effect of charged-particle bombardment on collector mirror reflectivity in EUV lithography devices [J].

Allain, J. P. ;

Nieto, M. ;

Hassanein, A. ;

Titov, V. ;

Plotkin, P. ;

Hendricks, M. ;

Hinson, E. ;

Chrobak, C. ;

van der Velden, M. H. L. ;

Rice, B. .

EMERGING LITHOGRAPHIC TECHNOLOGIES X, PTS 1 AND 2, 2006, 6151 :U1349-U1358

[2] Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen [J].

Astakhov, D. I. ;

Goedheer, W. J. ;

Lee, C. J. ;

Ivanov, V. V. ;

Krivtsun, V. M. ;

Koshelev, K. N. ;

Lopaev, D. V. ;

van der Horst, R. M. ;

Beckers, J. ;

Osorio, E. A. ;

Bijkerk, F. .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2016, 49 (29)

[3] Absolute measurement of the total ion-drag force on a single plasma-confined microparticle at the void edge under microgravity conditions [J].

Beckers, J. ;

Trienekens, D. J. M. ;

Kroesen, G. M. W. .

PHYSICAL REVIEW E, 2013, 88 (05)

[4] Microparticles in a Collisional Rf Plasma Sheath under Hypergravity Conditions as Probes for the Electric Field Strength and the Particle Charge [J].

Beckers, J. ;

Ockenga, T. ;

Wolter, M. ;

Stoffels, W. W. ;

van Dijk, J. ;

Kersten, H. ;

Kroesen, G. M. W. .

PHYSICAL REVIEW LETTERS, 2011, 106 (11)

[5]

Bouchoule A., 1999, DUSTY PLASMAS PHYS C, P1

[6] ELECTRON AFFINITY OF ATOMIC OXYGEN [J].

BRANSCOMB, LM .

NATURE, 1958, 182 (4630) :248-249

[7] Shielding of a Small Charged Particle in Weakly Ionized Plasmas [J].

Chaudhuri, Manis ;

Khrapak, Sergey A. ;

Kompaneets, Roman ;

Morfill, Gregor E. .

IEEE TRANSACTIONS ON PLASMA SCIENCE, 2010, 38 (04) :818-825

[8] Residual dust charges in discharge afterglow [J].

Couedel, L. ;

Mikikian, M. ;

Boufendi, L. ;

Samarian, A. A. .

PHYSICAL REVIEW E, 2006, 74 (02)

[9] Complex Plasma Afterglow [J].

Couedel, L. ;

Mezeghrane, A. ;

Samarian, A. A. ;

Mikikian, M. ;

Tessier, Y. ;

Cavarroc, M. ;

Boufendi, L. .

CONTRIBUTIONS TO PLASMA PHYSICS, 2009, 49 (4-5) :235-259

[10] Dust charge distribution in complex plasma afterglow [J].

Couedel, L. ;

Samarian, A. A. ;

Mikikian, M. ;

Boufendi, L. .

EPL, 2008, 84 (03)

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