Stark broadening of impurity absorption lines by inhomogeneous electric fields in highly compensated germanium

被引:4
作者
Harada, Y [1 ]
Fujii, K [1 ]
Ohyama, T [1 ]
Itoh, KM [1 ]
Haller, EE [1 ]
机构
[1] UNIV CALIF BERKELEY,LAWRENCE BERKELEY LAB,BERKELEY,CA 94720
来源
PHYSICAL REVIEW B | 1996年 / 53卷 / 24期
关键词
D O I
10.1103/PhysRevB.53.16272
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Stark broadening of Zeeman absorption lines caused by inhomogeneous electric fields in highly compensated Ge has been studied by means of far-infrared magneto-optical absorption spectroscopy measurements. A number of transmutation-doped Ge single crystals with a systematically varying compensation ratio were employed. The broadening of the full width at half maximum (FWHM) of an absorption line of the Ga acceptor is studied as a function of excitation light intensity with above-band-gap energy. The FWHM increases with decreasing intensity of the band-edge light excitation. Observation of the theoretically predicted 4/3-power law of Stark broadening, due to ionized impurities, is reported. The line broadening originates in the Stark affect, due to inhomogeneous electric fields caused by the random distribution of ionized impurities. In order to understand the mechanism for the line broadening in detail, a numerical approach based on a Monte Carlo simulation has been performed. The results of this simulation show that the inhomogeneity of the field distribution becomes larger with increasing concentration of ionized impurities. The simulation based on a perfectly random distribution for an initial impurity arrangement gives a Fairly good agreement with the experimental results. We conclude that the distribution of impurities in transmutation-doped Ge samples is close to random.
引用
收藏
页码:16272 / 16278
页数:7
相关论文
共 26 条
[1]  
BALTENSPERGER W, 1953, PHILOS MAG, V44, P1355
[2]   PHONON BROADENING OF IMPURITY SPECTRAL LINES .2. APPLICATION TO SILICON [J].
BARRIE, R ;
NISHIKAWA, K .
CANADIAN JOURNAL OF PHYSICS, 1963, 41 (11) :1823-&
[4]   TRANSMUTATION-PRODUCED GERMANIUM SEMICONDUCTORS [J].
CLELAND, JW ;
LARKHOROVITZ, K ;
PIGG, JC .
PHYSICAL REVIEW, 1950, 78 (06) :814-815
[5]   INFRARED ABSORPTION LINES IN BORON-DOPED SILICON [J].
COLBOW, K .
CANADIAN JOURNAL OF PHYSICS, 1963, 41 (11) :1801-&
[6]   INHOMOGENEOUS LINE BROADENING FOR INFRARED-ABSORPTION BY SHALLOW DONORS IN A QUANTUM-WELL - MONTE-CARLO SIMULATION [J].
EMMEL, PD ;
LIMA, ICD .
SOLID STATE COMMUNICATIONS, 1994, 89 (08) :725-730
[7]  
Haller E. E., 1984, Neutron Transmutation Doping of Semiconductor Materials. Proceedings of the Fourth International Conference, P21
[8]   INTERNAL STARK-EFFECT BY INHOMOGENEOUS ELECTRIC-FIELDS IN HIGHLY COMPENSATED P-INSB [J].
HARADA, Y ;
FUJII, K ;
OHYAMA, T .
JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1994, 63 (10) :3880-3885
[9]  
Holtsmark J, 1919, ANN PHYS-BERLIN, V58, P577
[10]  
HORRI K, 1971, J PHYS SOC JPN, V31, P783