Processing dependent behavior of soft imprint lithography on the 1--10-nm scale

被引:44
作者
Hua, Feng
Gaur, Anshu
Sun, Yugang
Word, Michael
Jin, Niu
Adesida, Ilesanmi
Shim, Moonsub
Shim, Anne
Rogers, John A.
机构
[1] Univ Illinois, Dept Mat Sci & Engn, Beckman Inst, Urbana, IL 61801 USA
[2] Univ Illinois, Seitz Mat Res Lab, Urbana, IL 61801 USA
[3] Univ Illinois, Dept Elect & Comp Engn, Urbana, IL 61801 USA
[4] Univ Illinois, Dept Mat Sci & Engn, Dept Chem, Beckman Inst, Urbana, IL 61801 USA
关键词
imprint lithography; next generation lithography; poly(dimethylsiloxane) (PDMS); polymer physics; replica molding;
D O I
10.1109/TNANO.2006.874051
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper examines aspects of a soft nanoimprint lithography technique for operation at resolutions that approach the 1-mn regime. Systematic studies using polymer molds made with single walled carbon nanotubes (diameters between 0.5 and 5 nm) and high-resolution electron beam patterned layers of hydrogen silsesquioxane (line widths and heights similar to 10 and 20 nm, respectively) as templates reveal a dependence of the resolution limits on the polymer processing conditions. In particular, using a single choice of polymers for the molds and the molded materials, imprint results show that the conditions for spin casting and curing the polymers determine, to a large degree, the resolution and replication fidelity that can be achieved. Optimized procedures enable imprinted polymer surfaces that have a root mean squared surface roughness of similar to 0.26 nm or lower and a resolution as high as similar to 1 nm. These characteristics are significantly better than previous results obtained using these same polymers with unoptimized conditions. A diversity of molded polymers, including Bisphenol-F epoxy resin, polyacrylic acid, and polyurethane, show similar high-fidelity imprinting capabilities. Different procedures enable accurate relief replication for features with modest aspect ratios and dimensions of similar to 10 nm. The results indicate that choice of processing conditions is; in addition to materials selections, extremely important in achieving high-fidelity soft nanoimprint lithography in the 1-10-nm regime.
引用
收藏
页码:301 / 308
页数:8
相关论文
共 25 条
[11]   FEATURES OF GOLD HAVING MICROMETER TO CENTIMETER DIMENSIONS CAN BE FORMED THROUGH A COMBINATION OF STAMPING WITH AN ELASTOMERIC STAMP AND AN ALKANETHIOL INK FOLLOWED BY CHEMICAL ETCHING [J].
KUMAR, A ;
WHITESIDES, GM .
APPLIED PHYSICS LETTERS, 1993, 63 (14) :2002-2004
[12]   Growth of single-walled carbon nanotubes from discrete catalytic nanoparticles of various sizes [J].
Li, YM ;
Kim, W ;
Zhang, YG ;
Rolandi, M ;
Wang, DW ;
Dai, HJ .
JOURNAL OF PHYSICAL CHEMISTRY B, 2001, 105 (46) :11424-11431
[13]   Roughness of thin perfluoropolyether lubricant films: Influence on disk drive technology [J].
Mate, CM ;
Toney, MF ;
Leach, KA .
IEEE TRANSACTIONS ON MAGNETICS, 2001, 37 (04) :1821-1823
[14]   Ultrahigh-density nanowire lattices and circuits [J].
Melosh, NA ;
Boukai, A ;
Diana, F ;
Gerardot, B ;
Badolato, A ;
Petroff, PM ;
Heath, JR .
SCIENCE, 2003, 300 (5616) :112-115
[15]  
Michael Rubinstein R. H. C., 2003, POLYM PHYS, V173
[16]   Improved pattern transfer in soft lithography using composite stamps [J].
Odom, TW ;
Love, JC ;
Wolfe, DB ;
Paul, KE ;
Whitesides, GM .
LANGMUIR, 2002, 18 (13) :5314-5320
[17]   AN INTRINSIC RELATIONSHIP BETWEEN MOLECULAR-STRUCTURE IN SELF-ASSEMBLED N-ALKYLSILOXANE MONOLAYERS AND DEPOSITION TEMPERATURE [J].
PARIKH, AN ;
ALLARA, DL ;
AZOUZ, IB ;
RONDELEZ, F .
JOURNAL OF PHYSICAL CHEMISTRY, 1994, 98 (31) :7577-7590
[18]   Siloxane polymers for high-resolution, high-accuracy soft lithography [J].
Schmid, H ;
Michel, B .
MACROMOLECULES, 2000, 33 (08) :3042-3049
[19]   Evidence for capillary waves at immiscible polymer/polymer interfaces [J].
Sferrazza, M ;
Xiao, C ;
Jones, RAL ;
Bucknall, DG ;
Webster, J ;
Penfold, J .
PHYSICAL REVIEW LETTERS, 1997, 78 (19) :3693-3696
[20]   Device performance and polymer morphology in polymer light emitting diodes: The control of thin film morphology and device quantum efficiency [J].
Shi, Y ;
Liu, J ;
Yang, Y .
JOURNAL OF APPLIED PHYSICS, 2000, 87 (09) :4254-4263