Adsorption sites of Te on Si(001)

被引:4
|
作者
Lyman, PF
Walko, DA
Marasco, DL
Hutchason, HL
Keeffe, ME
Montano, PA
Bedzyk, MJ [1 ]
机构
[1] Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
[2] Univ Wisconsin, Dept Phys, Milwaukee, WI 53201 USA
[3] Argonne Natl Lab, Adv Photon Source, CAT, MHATT, Argonne, IL 60439 USA
[4] Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA
[5] Univ Illinois, Dept Phys, Chicago, IL 60607 USA
基金
美国国家科学基金会;
关键词
X-ray standing waves; thermal desorption spectroscopy; low energy electron diffraction (LEED); surface structure; morphology; roughness; and topography; silicon; chalcogens; low index single crystal surfaces;
D O I
10.1016/j.susc.2004.05.071
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Using multiple surface science techniques, we have investigated the structure of 0.3-1 Te monolayers adsorbed on Si(0 0 1). X-ray standing waves, low-energy electron diffraction, temperature-programmed desorption, and Auger electron spectroscopy show a relatively poorly-ordered surface. The disorder is due to two nearly degenerate Te adsorption sites, which tends to double the periodicity along one direction of the surface and reduces adatom/substrate mismatch by slightly increasing the separation of adjacent Te atoms. High-temperature anneals around 575 degreesC increase the degree of local and long-range order, while leaving the average local structure unchanged. Our findings are consistent with recent ab initio molecular dynamics simulations but not with experimental studies wherein surfaces were prepared by desorption of CdTe films. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:248 / 260
页数:13
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