Fabrication and Ferroelectric Properties of BaTiO3 Thin Films Deposited on Silicon Substrate Using PLD

被引:9
作者
Dwivedi, Vinod Kumar [1 ]
机构
[1] Indian Inst Technol, Mat Sci Programme, Kanpur 208016, Uttar Pradesh, India
关键词
Ferroelectric; Pulsed Laser Deposition; XRD; BaTiO3; OXIDE; POLARIZATION;
D O I
10.1016/j.matpr.2017.10.032
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this work, thin films of BaTiO3 have been fabricated by pulsed-laser ablation on silicon substrate. The x-ray diffraction pattern of the polycrystalline and post annealed films in presence of oxygen indicates perovskite tetragonal phase. The room temperature ferroelectric response measured by "Positive-Up-Negative-Down" PUND method shows hysteretic behaviour in polarization versus electric field loops, confirms the traditional ferroelectric nature. The polarization switching dynamics can be described by Kolmogorov-Avrami-Ishibashi (KAI) model based on nucleation and growth of domains. The room temperature ferroelectricity of BaTiO3 deposited on silicon substrate is promising for application in electronic and memory devices. (C) 2017 Elsevier Ltd. All rights reserved.
引用
收藏
页码:9132 / 9137
页数:6
相关论文
共 18 条
[1]   Ferroelectricity at the nanoscale: Local polarization in oxide thin films and heterostructures [J].
Ahn, CH ;
Rabe, KM ;
Triscone, JM .
SCIENCE, 2004, 303 (5657) :488-491
[2]   Defect-mediated ferroelectric domain depinning of polycrystalline BiFeO3 multiferroic thin films [J].
Bretos, I. ;
Jimenez, R. ;
Gutierrez-Lazaro, C. ;
Montero, I. ;
Calzada, M. L. .
APPLIED PHYSICS LETTERS, 2014, 104 (09)
[3]   The influence of an extrinsic interfacial layer on the polarization of sputtered BaTiO3 film -: art. no. 202905 [J].
Cho, YW ;
Choi, SK ;
Rao, GV .
APPLIED PHYSICS LETTERS, 2005, 86 (20) :1-3
[4]   Physics of thin-film ferroelectric oxides [J].
Dawber, M ;
Rabe, KM ;
Scott, JF .
REVIEWS OF MODERN PHYSICS, 2005, 77 (04) :1083-1130
[5]   Strains in BaTiO3 thin film deposited onto Pt-coated Si substrate [J].
Dkhil, Brahim ;
Defay, Emmanuel ;
Guillan, Julie .
APPLIED PHYSICS LETTERS, 2007, 90 (02)
[6]   Evaluation of electrical properties of leaky BiFeO3 films in high electric field region by high-speed positive-up-negative-down measurement [J].
Naganuma, Hiroshi ;
Inoue, Yosuke ;
Okamura, Soichiro .
APPLIED PHYSICS EXPRESS, 2008, 1 (06) :0616011-0616013
[7]   Multiferroics: progress and prospects in thin films [J].
Ramesh, R. ;
Spaldin, Nicola A. .
NATURE MATERIALS, 2007, 6 (01) :21-29
[8]   Nanosize ferroelectric oxide -: tracking down the superparaelectric limit [J].
Rüdiger, A ;
Schneller, T ;
Roelofs, A ;
Tiedke, S ;
Schmitz, T ;
Waser, R .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2005, 80 (06) :1247-1255
[9]   BiFeO3 epitaxial thin films and devices: past, present and future [J].
Sando, D. ;
Barthelemy, A. ;
Bibes, M. .
JOURNAL OF PHYSICS-CONDENSED MATTER, 2014, 26 (47)
[10]   Oxide nano-engineering using MBE [J].
Schlom, DG ;
Haeni, JH ;
Lettieri, J ;
Theis, CD ;
Tian, W ;
Jiang, JC ;
Pan, XQ .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2001, 87 (03) :282-291