Tuning magnetic properties of yttrium iron garnet film with oxygen partial pressure in sputtering and annealing process

被引：11

作者：

Yang, Qing-Hui ^{[1
]}

Zhang, Huai-Wu ^{[1
]}

Wen, Qi-Ye ^{[1
]}

Liu, Ying-Li ^{[1
]}

Xiao, John Q. ^{[2
]}

机构：

[1] Univ Elect Sci & Technol China, State Key Lab Elect Films & Integrated Devices, Chengdu 610054, Peoples R China

[2] Univ Delaware, Dept Phys & Astron, Newark, DE 19716 USA

来源：

JOURNAL OF APPLIED PHYSICS | 2009年 / 105卷 / 07期

基金：

中国国家自然科学基金;

关键词：

THIN-FILMS; LASER DEPOSITION; YIG; MICROSTRUCTURE; TEMPERATURE;

D O I：

10.1063/1.3055286

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

In this paper, the magnetic properties of these films which deposited and annealed at different atmospheres were investigated. The experimental results show that the magnetic properties of yttrium iron garnet films prepared by rf magnetron sputtering method can be tuned with oxygen partial pressure in sputtering and annealing processes. The optimal condition is depositing in atmosphere of R=0 and annealing at 0.5 Pa O-2, or depositing in atmosphere of R=2% and annealed in vacuum. (C) 2009 American Institute of Physics. [DOI: 10.1063/1.3055286]

引用

页数：3

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