Low-Temperature Sputtered Nickel Oxide Compact Thin Film as Effective Electron Blocking Layer for Mesoscopic NiO/CH3NH3PbI3 Perovskite Heterojunction Solar Cells

被引:326
作者
Wang, Kuo-Chin [1 ]
Shen, Po-Shen [1 ]
Li, Ming-Hsien [1 ]
Chen, Shi [1 ]
Lin, Ming-Wei [4 ]
Chen, Peter [1 ,2 ,3 ]
Guo, Tzung-Fang [1 ,2 ,3 ]
机构
[1] Natl Cheng Kung Univ, Dept Photon, Tainan 701, Taiwan
[2] Natl Cheng Kung Univ, RCETS, Tainan 701, Taiwan
[3] Natl Cheng Kung Univ, AOTC, Tainan 701, Taiwan
[4] NSRRC, Hsinchu, Taiwan
关键词
pervoskite solar cell; sputtering; NiOx thin film; mesoscopic heterojunction; low temperature process; ORGANOMETAL HALIDE PEROVSKITES; INORGANIC HOLE CONDUCTOR; ANODE INTERFACIAL LAYER; OPTICAL-PROPERTIES; EFFICIENT; PERFORMANCE; DEPOSITION; IODIDE; OXYGEN; NIO;
D O I
10.1021/am503610u
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We introduce the use of low temperature sputtered NiOx thin film, which substitutes the PEDOT-PSS and solution-processed NiOx as an effective electron blocking layer for mesoscopic NiO/CH3NH3PbI3 perovskite solar cells. The influences of film thickness and oxygen doping on the photovoltaic performances are scrutinized. The cell efficiency has been improved from 9.5(1) to 10.7% for devices using NiOx fabricated under pure argon atmosphere. With adequate doping under 10% oxygen flow ratio, we achieved power conversion efficiency of 11.6%. The procedure is large area scalable and has the advantage for cost-effective perovskite-based photovoltaics.
引用
收藏
页码:11851 / 11858
页数:8
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