Some Aspects of Reactive Complex Plasmas

被引：104

作者：

Berndt, J. ^{[1
]}

Kovacevic, E. ^{[1
]}

Stefanovic, I. ^{[2
]}

Stepanovic, O.

Hong, S. H. ^{[3
]}

Boufendi, L. ^{[1
]}

Winter, J. ^{[2
]}

机构：

[1] Univ Orleans, GREMI, Orleans 2, France

[2] Ruhr Univ Bochum, Inst Expt Phys 2, Bochum, Germany

[3] Natl Fus Res Inst, KSTAR Res Ctr, Joint Expt Team, Taejon, South Korea

来源：

CONTRIBUTIONS TO PLASMA PHYSICS | 2009年 / 49卷 / 03期

关键词：

Plasma; reactive; dust; nanoparticles; polymerization; DUST PARTICLE FORMATION; FAST HYDROGEN-ATOMS; LOW-PRESSURE; RADIOFREQUENCY DISCHARGE; PARTICULATE FORMATION; ALPHA EMISSION; RF; GROWTH; AR/C2H2; GENERATION;

D O I：

10.1002/ctpp.200910016

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

Reactive plasmas are nowadays widely used for technological applications. The spontaneous formation and growth of dust is a phenomenon frequently observed in such plasmas. The formation of dust particles has been observed in great variety of different discharge types and in different kind of gases or pas mixtures. Due to the large variety of different phenomena that can be observed in reactive complex plasmas this article will address some selected (general) problems and examples that are specific for the physics and chemistry of Such systems. These examples concern the formation and growth of dust particles in reactive plasmas, the mechanisms responsible for that growth processes, the spatial distribution of the dust particles within the discharge, the response of the plasma to the formation and growth of dust particles and some technological aspects. (C) 2009 WILEY-VCH Verlag GmbH & Co, KGaA, Weinheim.

引用

页码：107 / 133

页数：27

共 85 条

[1] Particulates in C(2)F(6)-CHF(3) and CF(4)-CHF(3) etching plasmas [J].