Reactive pulse magnetron sputtered SiOxNy coatings on polymers

被引:19
作者
Lau, K. [1 ]
Weber, J. [1 ]
Bartzsch, H. [1 ]
Frach, P. [1 ]
机构
[1] FEP, Fraunhofer Inst Electron Beam & Plasma Technol, D-01277 Dresden, Germany
关键词
Pulse magnetron sputtering; Silicon oxynitride; Optical coating; SILICON OXYNITRIDE FILMS; OPTICAL-PROPERTIES;
D O I
10.1016/j.tsf.2008.11.084
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Amorphous SiO2, Si3N4 and SiOxNy single layers have been deposited on silicon, glass and glycol modified polyethylene terephthalate substrates by reactive pulse magnetron sputtering. Apart from the expected correlation between refractive index, coating density and nitrogen content in the reactive gas mixture further results have been found regarding mechanical stress and the humidity barrier property of these thin films. The lowest compressive stress was observed in the coatings deposited with nitrogen contents of around 30% to 50% in the reactive gas mixture. The humidity barrier effect of the thin films already begins to increase significantly at low nitrogen contents of below 20% in the reactive gas. Additional investigations regarding chemical composition, coating adhesion and environmental stability complement this work with the main focus on optimizing these materials for optical multilayer systems on polymer substrates. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:3110 / 3114
页数:5
相关论文
共 15 条
[1]   Different pulse techniques for stationary reactive sputtering with double ring magnetron [J].
Bartzsch, H ;
Frach, P ;
Goedicke, K ;
Gottfried, C .
SURFACE & COATINGS TECHNOLOGY, 1999, 120 :723-727
[2]   Anode effects on energetic particle bombardment of the substrate in pulsed magnetron sputtering [J].
Bartzsch, H ;
Frach, P ;
Goedicke, K .
SURFACE & COATINGS TECHNOLOGY, 2000, 132 (2-3) :244-250
[3]   Composition and optical properties of silicon oxynitride films deposited by electron cyclotron resonance [J].
del Prado, A ;
San Andrés, E ;
Martinez, FL ;
Mártil, I ;
González-Díaz, G ;
Bohne, W ;
Röhrich, J ;
Selle, B ;
Fernández, M .
VACUUM, 2002, 67 (3-4) :507-512
[4]   INFRARED OPTICAL-PROPERTIES OF SILICON OXYNITRIDE FILMS - EXPERIMENTAL-DATA AND THEORETICAL INTERPRETATION [J].
ERIKSSON, TS ;
GRANQVIST, CG .
JOURNAL OF APPLIED PHYSICS, 1986, 60 (06) :2081-2091
[5]   VIBRATIONAL PROPERTIES OF SIO AND SIH IN AMORPHOUS SIOX-H FILMS (0-LESS-THAN-OR-EQUAL-TO-X-LESS-THAN-OR-EQUAL-TO-2.0) PREPARED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION [J].
HE, L ;
INOKUMA, T ;
KURATA, Y ;
HASEGAWA, S .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1995, 185 (03) :249-261
[6]  
*ISO, 2005, 151063 ISO 3, P12113
[7]  
*ISO, 2006, 92114 ISO 4, P12113
[8]  
*ISO, 2002, 90222 ISO 2, P12113
[9]  
LAU K, 2006, THESIS M LUTHER U HA, P12113
[10]   Kinetics of residual stress evolution in evaporated silicon dioxide films exposed to room air [J].
Leplan, H ;
Robic, JY ;
Pauleau, Y .
JOURNAL OF APPLIED PHYSICS, 1996, 79 (09) :6926-6931