The Aerosol-Assisted CVD of Silver Films from Single-Source Precursors

被引：17

作者：

Panneerselvam, Arunkumar ^{[1
,2
]}

Malik, Mohammad A. ^{[1
,2
]}

O'Brien, Paul ^{[1
,2
]}

Helliwell, Madeleine ^{[1
]}

机构：

[1] Univ Manchester, Sch Chem, Manchester M13 9PL, Lancs, England

[2] Univ Manchester, Sch Mat, Manchester M13 9PL, Lancs, England

来源：

CHEMICAL VAPOR DEPOSITION | 2009年 / 15卷 / 1-3期

关键词：

AACVD; Silver; Thin films; Single-source precursors; Temperature gradient; CHEMICAL-VAPOR-DEPOSITION; AG-I COMPLEXES; THIN-FILMS; TERTIARY PHOSPHINES; PERFLUORINATED CARBOXYLATES; CRYSTAL STRUCTURES; FACILE SYNTHESIS; METAL; GOLD; ADDUCTS;

D O I：

10.1002/cvde.200806729

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Thin films of silver are deposited from tetraplienyldioxoimidodiphosphinato silver(I) [Ag{(OPPh(2))(2)N}](4)center dot 2H(2)O (1) and silver(I) triflouoroacetate CF(3)COOAg (2) single-source precursors (SSPs) by the aerosol-assisted (AA)CVD method. The complex (1) is a tetramer with linear and distorted tetrahedral coordination modes at silver. Two types of films, silvery and brownish, are observed from both SSPs due to the temperature gradient in the AACVD reactor. The as-deposited films are characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive X-ray (EDX) analysis, and ultraviolet/visible (UV-vis) spectroscopy methods.

引用

页码：57 / 63

页数：7

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