The Aerosol-Assisted CVD of Silver Films from Single-Source Precursors

被引:17
作者
Panneerselvam, Arunkumar [1 ,2 ]
Malik, Mohammad A. [1 ,2 ]
O'Brien, Paul [1 ,2 ]
Helliwell, Madeleine [1 ]
机构
[1] Univ Manchester, Sch Chem, Manchester M13 9PL, Lancs, England
[2] Univ Manchester, Sch Mat, Manchester M13 9PL, Lancs, England
关键词
AACVD; Silver; Thin films; Single-source precursors; Temperature gradient; CHEMICAL-VAPOR-DEPOSITION; AG-I COMPLEXES; THIN-FILMS; TERTIARY PHOSPHINES; PERFLUORINATED CARBOXYLATES; CRYSTAL STRUCTURES; FACILE SYNTHESIS; METAL; GOLD; ADDUCTS;
D O I
10.1002/cvde.200806729
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Thin films of silver are deposited from tetraplienyldioxoimidodiphosphinato silver(I) [Ag{(OPPh(2))(2)N}](4)center dot 2H(2)O (1) and silver(I) triflouoroacetate CF(3)COOAg (2) single-source precursors (SSPs) by the aerosol-assisted (AA)CVD method. The complex (1) is a tetramer with linear and distorted tetrahedral coordination modes at silver. Two types of films, silvery and brownish, are observed from both SSPs due to the temperature gradient in the AACVD reactor. The as-deposited films are characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive X-ray (EDX) analysis, and ultraviolet/visible (UV-vis) spectroscopy methods.
引用
收藏
页码:57 / 63
页数:7
相关论文
共 74 条
[1]   Morphology of silver thin films deposited on TiO2(110) surfaces [J].
Abriou, D ;
Gagnot, D ;
Jupille, J ;
Creuzet, F .
SURFACE REVIEW AND LETTERS, 1998, 5 (01) :387-392
[2]  
[Anonymous], 1997, SHELXL 97 SHELXS 97
[3]   SYNTHESIS AND CHARACTERIZATION OF 1,1,1,5,5,5-HEXAFLUOROACETYLACETONATO-(1,5-CYCLOOCTADIENE)SILVER(I) DIMER - AN UNUSUAL BETA-DIKETONATE COORDINATION MODE [J].
BAILEY, A ;
CORBITT, TS ;
HAMPDENSMITH, MJ ;
DUESLER, EN ;
KODAS, TT .
POLYHEDRON, 1993, 12 (14) :1785-1792
[4]   A study on the metal-organic CVD of pure copper films from low cost copper(II) dialkylamino-2-propoxides: Tuning the thermal properties of the precursor by small variations of the ligand [J].
Becker, R ;
Devi, A ;
Weiss, J ;
Weckenmann, U ;
Winter, M ;
Kiener, C ;
Becker, HW ;
Fischer, RA .
CHEMICAL VAPOR DEPOSITION, 2003, 9 (03) :149-156
[5]   ORGANOMETALLIC COMPOUNDS - THE CHEMISTS CONTRIBUTION TO NEW ELECTRONIC MATERIALS [J].
BLESSMANN, D ;
GRAFE, A ;
HEINEN, R ;
JANSEN, F ;
KRUCK, T ;
TERFLOTH, C .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1993, 17 (1-3) :104-107
[6]  
BRUKER, 2001, SHELXTL VERSION 6 12
[7]  
BUCKLEY F, 2006, P INT C NAN NAN, V528
[8]   Micron thick epitaxial (100) Ag film growth on MgO [J].
Carter, AC ;
Chang, W ;
Qadri, SB ;
Horwitz, JS ;
Leuchtner, R ;
Chrisey, DB .
JOURNAL OF MATERIALS RESEARCH, 1998, 13 (06) :1418-1421
[9]  
Chi KM, 1997, POLYHEDRON, V16, P2147
[10]  
Chi KM, 2001, CHEM VAPOR DEPOS, V7, P117