Rapid thermal annealing in the microsecond regime

被引：1
|
作者：
Thompson, MO [1 ]
机构：
[1] Cornell Univ, Dept Mat Sci, Ithaca, NY 14853 USA
来源：
10TH IEEE INTERNATIONAL CONFERENCE ON ADVANCED THERMAL PROCESSING OF SEMICONDUCTORS - RTP 2002 | 2002年
关键词：
D O I：
10.1109/RTP.2002.1039460
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：193 / 193
页数：1
相关论文
共 50 条
  • [1] Annealing thermal donors in CZSi crystal by rapid thermal annealing
    Luan, Hongfa
    Zhang, Guohu
    Li, Bing
    Chen, Xueqing
    Qin, Fu
    Qian, Peixin
    Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 1995, 16 (10): : 789 - 793
  • [2] Rapid thermal annealing of CoXN
    Beshkova, M
    Beshkov, G
    Marinov, M
    Bogdanov-Dimitrov, D
    Mladenov, G
    Tanaka, T
    Kawabata, K
    MATERIALS AND MANUFACTURING PROCESSES, 2001, 16 (04) : 531 - 540
  • [3] RAPID THERMAL ANNEALING OF AS IN SI
    SHIH, NT
    HUANG, FS
    CHU, CH
    CHEN, WS
    RAPID THERMAL ANNEALING / CHEMICAL VAPOR DEPOSITION AND INTEGRATED PROCESSING, 1989, 146 : 371 - 376
  • [4] RAPID THERMAL PULSE ANNEALING
    MILLER, MG
    KOEHN, BW
    CHAPLIN, RL
    RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1976, 30 (02): : 73 - 79
  • [5] Effects of rapid thermal annealing on Cr/Si/Pt Schottky photodetector in the mid-infrared regime
    Li, Yu-Hao
    Lin, Ching-Fuh
    NANOSCALE AND QUANTUM MATERIALS: FROM SYNTHESIS AND LASER PROCESSING TO APPLICATIONS 2022, 2022, 11990
  • [6] ARSINE AMBIENT RAPID THERMAL ANNEALING
    JACKSON, TN
    DEGELORMO, JF
    PEPPER, G
    ADVANCES IN MATERIALS, PROCESSING AND DEVICES IN III-V COMPOUND SEMICONDUCTORS, 1989, 144 : 403 - 408
  • [7] REFLOW OF PSG BY RAPID THERMAL ANNEALING
    ALVI, NS
    KWONG, DL
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (08) : C354 - C354
  • [8] Rapid thermal annealing of FePt nanoparticles
    Department of Physics, University of Texas at Arlington, Arlington, TX 76019, United States
    Journal of Applied Physics, 2008, 104 (01):
  • [9] RAPID THERMAL ANNEALING OF COBALT ON SILICON
    SITARAM, AR
    MURARKA, SP
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (08) : C360 - C361
  • [10] RAPID THERMAL ANNEALING OF GAAS ICS
    SHEN, YD
    WELCH, B
    LIAW, YP
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (04) : C176 - C176
12345