Ultrafast spontaneous emission of copper-doped silicon enhanced by an optical nanocavity

被引:28
作者
Sumikura, Hisashi [1 ,2 ]
Kuramochi, Eiichi [1 ,2 ]
Taniyama, Hideaki [1 ,2 ]
Notomi, Masaya [1 ,2 ]
机构
[1] NTT Corp, NTT, Basic Res Labs, Atsugi, Kanagawa 2430198, Japan
[2] NTT Corp, NTT Nanophoton Ctr, Atsugi, Kanagawa 2430198, Japan
来源
SCIENTIFIC REPORTS | 2014年 / 4卷
关键词
LIGHT-EMISSION; DYNAMICS; EXCITONS; DEFECT;
D O I
10.1038/srep05040
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Dopants in silicon (Si) have attracted attention in the fields of photonics and quantum optics. However, the optical characteristics are limited by the small spontaneous emission rate of dopants in Si. This study demonstrates a large increase in the spontaneous emission rate of copper isoelectronic centres (Cu-IECs) doped into Si photonic crystal nanocavities. In a cavity with a quality factor (Q) of similar to 16,000, the photoluminescence (PL) lifetime of the Cu-IECs is 1.1 ns, which is 30 times shorter than the lifetime of a sample without a cavity. The PL decay rate is increased in proportion to Q/V-c (V-c is the cavity mode volume), which indicates the Purcell effect. This is the first demonstration of a cavity-enhanced ultrafast spontaneous emission from dopants in Si, and it may lead to the development of fast and efficient Si light emitters and Si quantum optical devices based on dopants with efficient optical access.
引用
收藏
页数:6
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