The rising cost and complexity of RETs

被引：8

作者：

Mason, ME ^{[1
]}

机构：

[1] Texas Instruments Inc, Resolut Enhancement Technol Grp, Dallas, TX 75243 USA

来源：

DESIGN AND PROCESS INTEGRATION FOR MICROELECTRONIC MANUFACTURING II | 2004年 / 5379卷

关键词：

D O I：

10.1117/12.546794

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

For the last several years, Resolution Enhancement Technologies (RETs) have helped make it possible for lithographers to stay on the path set for them by Goordon Moore. Though seldom discussed in detail, these RETs have a real cost in terms of data rile size, computation times, complexity of metrology and inspection, licenses fees, manpower and delay. The International Sematech Cost of Ownership (CoO) analysis(1) can be used to estimate the impact of RETs on overall Lithography CoO and on the cost per modern semiconductor wafer, which appears to be around $10/RET level for a high-volume ASIC case.

引用

页码：10 / 19

页数：10