Fabrication of (Fe,Mn)3O4 ferromagnetic oxide nanostructure using molybdenum nanomask atomic force microscope lithography

We reported the fabrication of Fe(2.5)Mn(0.5)O(4) (FMO) ferromagnetic oxide nanostructure using molybdenum (Mo) nanomask atomic force microscope (AFM) lithography technique for oxide nanospintronics applications. This technique enables us to prepare transition metal oxide nanostructures down to 200 nm. The hard x-ray photoemission spectroscopy revealed that the resulting nanostructures preserve a fine electric structure as spintronics oxide same as unprocessed films. The resulting FMO nanostructure showed the magnetoresistance of about -0.11% to -0.14% at the magnetic field of 3000 Oe, which value was similar to that of FMO film. These indicate that this technique can construct well defined nanoscale oxides both in structure and physical properties.