Total reflection x-ray photoelectron spectroscopy of a tantalum-titanium multilayer

被引：0

作者：

Kawai, J ^{[1
]}

Sai, M

Sugimura, T

Hayashi, K

Takenaka, H

Kitajima, Y

机构：

[1] Kyoto Univ, Dept Mat Sci & Engn, Sakyo Ku, Kyoto 6068501, Japan

[2] NTT Adv Technol Corp, NTT AT, Musashino, Tokyo 1808585, Japan

[3] High Energy Accelerator Res Org, Photon Factory, Inst Mat Struct Sci, Tsukuba, Ibaraki 3050801, Japan

来源：

X-RAY SPECTROMETRY | 1999年 / 28卷 / 06期

关键词：

D O I：

10.1002/(SICI)1097-4539(199911/12)28:6<519::AID-XRS395>3.3.CO;2-N

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

X-ray photoelectron spectra of two Ta-Ti bilayers on a Si wafer are measured using a soft x-ray synchrotron radiation beamline at the Photon Factory. The grazing incident x-rays are used to excite photoelectrons. The photoelectron intensity dependence is measured as the change in the glancing angle of the incident x-rays, A change in the angular dependence of photoelectron intensity and a chemical shift are observed with change in thermal treatment of the multilayer sample. Copyright (C) 1999 John Wiley & Sons, Ltd.

引用

页码：519 / 522

页数：4

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