Total reflection x-ray photoelectron spectroscopy of a tantalum-titanium multilayer

被引：0
|
作者：
Kawai, J [1 ]
Sai, M
Sugimura, T
Hayashi, K
Takenaka, H
Kitajima, Y
机构：
[1] Kyoto Univ, Dept Mat Sci & Engn, Sakyo Ku, Kyoto 6068501, Japan
[2] NTT Adv Technol Corp, NTT AT, Musashino, Tokyo 1808585, Japan
[3] High Energy Accelerator Res Org, Photon Factory, Inst Mat Struct Sci, Tsukuba, Ibaraki 3050801, Japan
来源：
X-RAY SPECTROMETRY | 1999年 / 28卷 / 06期
关键词：
D O I：
10.1002/(SICI)1097-4539(199911/12)28:6<519::AID-XRS395>3.3.CO;2-N
中图分类号：
O433 [光谱学];
学科分类号：
0703 ; 070302 ;
摘要：
X-ray photoelectron spectra of two Ta-Ti bilayers on a Si wafer are measured using a soft x-ray synchrotron radiation beamline at the Photon Factory. The grazing incident x-rays are used to excite photoelectrons. The photoelectron intensity dependence is measured as the change in the glancing angle of the incident x-rays, A change in the angular dependence of photoelectron intensity and a chemical shift are observed with change in thermal treatment of the multilayer sample. Copyright (C) 1999 John Wiley & Sons, Ltd.
引用
收藏
页码：519 / 522
页数：4
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