Modeling thermal contact resistance between elastic hemisphere and elastic layer bonded to elastic substrate

被引:1
|
作者
Stevanovic, M [1 ]
机构
[1] C MAC Engn Inc, Kanata, ON K2K 2W2, Canada
关键词
contact radius; elastic deformation; thermal constriction resistance;
D O I
10.1109/ITHERM.2002.1012457
中图分类号
O414.1 [热力学];
学科分类号
摘要
An approximate thermo-mechanical model is developed to predict thermal contact resistance of a hemisphere in elastic contact with a layered substrate. Numerical data are obtained for several combinations of layer material. It is shown that with the proper selection of dimensionless parameters the numerical results fall on a single curve that is easily correlated. The complex solution is reduced to a simple closed form solution for the unknown contact radius. The proposed thermo-mechanical model is applicable for any layer-substrate material combination over the full range of the layer thicknesses. The agreement between the theoretical predictions and experimental data is good at the light loads. A method for correcting the contact radius for elastic-plastic behavior at higher loads is presented.
引用
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页码:193 / 200
页数:8
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