The use of complex compounds in chemical vapour deposition

被引：6

作者：

Bessergenev, V ^{[1
]}

机构：

[1] Univ Algarve, FCT, Dept Phys, P-8000 Faro, Portugal

来源：

JOURNAL OF PHYSICS-CONDENSED MATTER | 2004年 / 16卷 / 05期

关键词：

D O I：

10.1088/0953-8984/16/5/010

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

During the last decade volatile metal complexes have been employed in the synthesis of oxide and sulfide thin films on an increasing scale. In this contribution some experimental details of the chemical vapour deposition technique and results of the use of complex compounds are discussed. The peculiarities of growth kinetics are demonstrated with several recent results.

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页码：S531 / S552

页数：22

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