Preparation of TiFe thin films by pulsed ion beam evaporation

被引：0
|
作者：
Suematsu, H [1 ]
Saikusa, T [1 ]
Suzuki, T [1 ]
Jiang, WH [1 ]
Yatsui, K [1 ]
机构：
[1] Nagaoka Univ Technol, Extreme Energy Dens Res Inst, Nagaoka, Niigata 9402188, Japan
来源：
SURFACE ENGINEERING 2001 - FUNDAMENTALS AND APPLICATIONS | 2001年 / 697卷
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D O I：
暂无
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Thin films of titanium iron (TiFe) were prepared by a pulsed ion-beam evaporation (IBE) method. A pulsed ion beam of proton accelerated at I MV (peak) with a pulse width of 50 ns and a current of 70 kA was focused on TiFe alloy targets. Soda lime glass substrates were placed in front of the targets. Phases in the thin films were identified by X-ray diffraction (XRD). XRD results revealed that the thin films deposited on the glass substrates consist of a TiFe phase. Crystallized Ti-Fe thin films without oxides were successfully obtained. Surface roughness of the thin film was 0.16 mum.
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页码：183 / 188
页数：6
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