Structural, linear, and nonlinear optical properties of radio-frequency-sputtered nitrogen-doped ZnO thin films studied using z-scan technique

被引:14
|
作者
Nagaraja, K. K. [1 ]
Pramodini, S. [2 ]
Kumar, A. Santhosh [1 ]
Nagaraja, H. S. [1 ]
Poornesh, P. [2 ]
机构
[1] Natl Inst Technol Karnataka, Dept Phys, Mat Res Lab, DK-575025 Surathkal, Karnataka, India
[2] Manipal Univ, Manipal Inst Technol, Dept Phys, Nonlinear Opt Res Lab, Manipal 576104, Karnataka, India
关键词
nitrogen doping; NLO; optical limiting; RSA; diffraction rings; SPRAY-PYROLYSIS; LIQUID; DIFFRACTION; CONDUCTIVITY; CRYSTAL; GROWTH; MEDIA; LASER; DYE;
D O I
10.1088/1054-660X/24/8/085402
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The third-order nonlinear optical properties of undoped and nitrogen-doped ZnO thin films were evaluated using the z-scan technique. The films were sputter-deposited on glass substrates using radio frequency power. The He-Ne continuous wave laser operating at 633 nm was used as an irradiation source. A change in the growth mode in the nitrogen-doped films was observed. The grain size and roughness were found to be dependent on the nitrogen concentration, as shown by atomic force microscopy analysis. The optical band gap was determined and found to increase with nitrogen concentration in the films. Both nonlinear absorption and refraction nonlinearities were exhibited by the deposited films. The nonlinear refractive index n(2), the nonlinear absorption coefficient beta(eff) and the third-order nonlinear optical susceptibility X-(3) were determined and found to be largest. Multiple diffraction ring patterns were observed when the samples were made to interact with the laser beam and were attributed to refractive index change and thermal lensing. Further, optical power-limiting experiments were performed to determine the optical-limiting threshold and clamping values for undoped and nitrogen-doped ZnO films.
引用
收藏
页数:9
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