Vacuum-ultraviolet absorption of interstitial O2 and H2O molecules in SiO2 glass

被引:7
作者
Kajihara, Koichi
Hirano, Masahiro
Skuja, Linards
Hosono, Hideo
机构
[1] Tokyo Inst Technol, Transparent Elect Act Mat Proj, ERATO,Frontier Collaborat Res Ctr, SORST,Japan Sci & Technol Agcy,Midori Ku, Yokohama, Kanagawa 2268503, Japan
[2] Tokyo Inst Technol, Mat & Struct Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan
[3] Tokyo Inst Technol, Frontier Collaborat Res Ctr, Midori Ku, Yokohama, Kanagawa 2268503, Japan
[4] Latvian State Univ, Inst Solid State Phys, LV-1063 Riga, Latvia
关键词
absorption; silica;
D O I
10.1016/j.jnoncrysol.2006.02.058
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Vacuum-ultraviolet (VUV) absorption of O-2 and H2O molecules incorporated in interstitial voids in SiO2 glass by thermal annealings was examined. Interactions of the interstitial molecules with the surrounding SiO2 glass network lead to a redshift of the VUV absorption band of interstitial O-2, while a blueshift of that of interstitial H2O, both accompanied by an increase in the intensity of the absorption bands. The Coulomb repulsion, London dispersion, and hydrogen bonding are the main interactions responsible for the modification of the VUV absorption bands. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:2303 / 2306
页数:4
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