Polycrystalline Ba0.6Sr0.4TiO3 thin films on r-plane sapphire:: Effect of film thickness on strain and dielectric properties

被引:19
作者
Fardin, E. A. [1 ]
Holland, A. S.
Ghorbani, K.
Akdogan, E. K.
Simon, W. K.
Safari, A.
Wang, J. Y.
机构
[1] Univ Melbourne, RMIT, Sch Elect & Comp Engn, Melbourne, Vic 3001, Australia
[2] Rutgers State Univ, Dept Mat Sci & Engn, Piscataway, NJ 08854 USA
[3] Swinburne Univ Technol, Ctr Atom Opt & Ultrafast Spect, ARC, Ctr Excellence Quantum Atom Opt, Hawthorn, Vic 3122, Australia
基金
澳大利亚研究理事会;
关键词
D O I
10.1063/1.2374810
中图分类号
O59 [应用物理学];
学科分类号
摘要
Polycrystalline Ba0.6Sr0.4TiO3 (BST) films grown on r-plane sapphire exhibit strong variation of in-plane strain over the thickness range of 25-400 nm. At a critical thickness of similar to 200 nm, the films are strain relieved; in thinner films, the strain is tensile, while compressive strain was observed in the 400 nm film. Microwave properties of the films were measured from 1 to 20 GHz by the interdigital capacitor method. A capacitance tunability of 64% was observed in the 200 nm film, while thinner films showed improved Q factor. These results demonstrate the possibility of incorporating frequency agile BST-based devices into the silicon on sapphire process. (c) 2006 American Institute of Physics.
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页数:3
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