Development of a process model for CO2 laser mitigation of PF damage growth in fused silica

被引:12
作者
Feit, MD [1 ]
Rubenchik, AM [1 ]
Boley, CD [1 ]
Rotter, M [1 ]
机构
[1] Lawrence Livermore Natl Lab, Livermore, CA 94550 USA
来源
LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 2003 | 2003年 / 5273卷
关键词
D O I
10.1117/12.523867
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
A numerical model of CO2, laser mitigation of damage growth in fused silica has been constructed that accounts for laser energy absorption, heat conduction, radiation transport, evaporation of fused silica and thermally induced stresses. This model will be used to understand scaling issues and effects of pulse and beam shapes on material removal, temperatures reached and stresses generated. Initial calculations show good agreement of simulated and measured material removal. The model has also been applied to LG-770 glass as a prototype red blocker material.
引用
收藏
页码:145 / 154
页数:10
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