Dust formation in Ar/CH4 and Ar/C2H2 plasmas

被引：58

作者：

Winter, J. ^{[1
]}

Berndt, J. ^{[1
]}

Hong, S-H ^{[1
]}

Kovacevic, E. ^{[1
]}

Stefanovic, I. ^{[1
]}

Stepanovic, O. ^{[1
]}

机构：

[1] Ruhr Univ Bochum, Inst Expt Phys 2, Bochum, Germany

来源：

PLASMA SOURCES SCIENCE & TECHNOLOGY | 2009年 / 18卷 / 03期

关键词：

ELECTRON; GROWTH; NANOPARTICLES; DISCHARGES; DEPOSITION; HYDROGEN;

D O I：

10.1088/0963-0252/18/3/034010

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

This paper discusses the growth of nanoparticles in capacitively and inductively coupled radio-frequency plasmas operated in hydrocarbon gases and the back-reaction of particles on the plasma properties. The focus is on the growth mechanism in CH4- and C2H2-containing plasmas, on the role of atomic hydrogen and on the dynamic charging and decharging of particles in pulsed plasmas.

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页数：8

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