Improving field emission properties of GaN nanowires by oxide coating

被引:81
作者
Tang, Cen-Cun [1 ]
Xu, Xue-Wen [1 ]
Hu, Long [1 ]
Li, Yang-Xian [1 ]
机构
[1] Hebei Univ Technol, Sch Mat Sci & Engn, Tianjin 300130, Peoples R China
关键词
accumulation layers; electron emission; Fermi level; field emission; gallium compounds; III-V semiconductors; nanowires; wide band gap semiconductors; work function; VAPOR-PHASE EPITAXY; ELECTRON-EMISSION; CARBON NANOTUBES; SIC NANOWIRES; ARRAYS; FILMS;
D O I
10.1063/1.3154564
中图分类号
O59 [应用物理学];
学科分类号
摘要
We compared the field emission properties of the following four types of nanowires: GaN nanowire, Ga2O3 nanowire, GaN nanowire with Ga2O3 coating, and Ga2O3 nanowire with GaN coating. The turn-on field values for the GaN, Ga2O3, GaN/Ga2O3, and Ga2O3/GaN nanowires are 4.3, 6.2, 4.7, and 2.6 V/mu m, respectively. It has been found that the oxide coatings effectively improve the field emission capability of GaN nanowires, while the nitride coatings depress electron emission of Ga2O3 nanowires. The corresponding Fowler-Nordheim analysis revealed that the field emission improvement is attributed to the electron accumulation on the coated oxide particles and the interfacial electron redistribution in the nanoscale hetero-structure which results in the shift of Fermi level and the changes of work functions.
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页数:3
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