Voltammetric study and electrodeposition of tellurium, lead, and lead telluride in room-temperature ionic liquid 1-ethyl-3-methylimidazolium tetrafluoroborate

被引：30

作者：

Tsai, Ren-Wei ^{[1
]}

Hsieh, Yi-Ting ^{[1
]}

Chen, Po-Yu ^{[2
,3
]}

Sun, I-Wen ^{[1
]}

机构：

[1] Natl Cheng Kung Univ, Dept Chem, Tainan 701, Taiwan

[2] Kaohsiung Med Univ, Dept Med & Appl Chem, Kaohsiung 807, Taiwan

[3] Natl Sun Yat Sen Univ, Dept Chem, Kaohsiung 804, Taiwan

来源：

ELECTROCHIMICA ACTA | 2014年 / 137卷

关键词：

Electrodeposition; Ionic liquid; Lead telluride; Nucleation; Semiconductor; PBTE THIN-FILMS; CHOLINE CHLORIDE; THERMOELECTRIC-MATERIALS; CADMIUM TELLURIDE; DEPOSITION; ELECTROCHEMISTRY; BEHAVIOR; GROWTH; SPECTROSCOPY; EPITAXY;

D O I：

10.1016/j.electacta.2014.05.099

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Room-temperature ionic liquid 1-ethyl-3-methylimidazolium tetrafluoroborate (RTIL EMI-BF4) was used as the electrolyte to study the voltammetric behavior of Te(IV), Pb(II), and their mixtures. Te(IV) and Pb(II) were introduced into the IL by the addition of TeCl4 and PbCl2, respectively, with sufficient 1-ethyl-3-methylimidazolium chloride (EMIC). The electrodeposition of Te, Pb, and PbTe was achieved under constant applied potential at nickel electrodes. The nucleation mechanisms of Te and Pb were determined to be three-dimensional instantaneous nucleation with diffusion-controlled growth. Crystalline stoichiometric PbTe electrodeposits were obtained via Pb under-potential deposition at the continuously growing surface of Te. They exhibited an energy bandgap of 0.22 eV. (C) 2014 Elsevier Ltd. All rights reserved.

引用

页码：49 / 56

页数：8

共 47 条

[1] Electrodeposition of bismuth, tellurium, and bismuth telluride thin films from choline chloride-oxalic acid ionic liquid [J].