Interface structure of selectively oxidized AlAs/GaAs

被引:51
作者
Takamori, T
Takemasa, K
Kamijoh, T
机构
[1] Semiconductor Technology Laboratory, R. and D. Group, Oki Electric Industry Co., Ltd., Hachioji, Tokyo 193
关键词
D O I
10.1063/1.117797
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present studies of the interface abruptness of selectively oxidized AlAs/GaAs multilayer structures using transmission electron microscopy (TEM). High-resolution cross-sectional TEM images reveal that the interfaces between oxidized AlAs and unoxidized regions (GaAs and AlAs) are extremely abrupt of atomic scale. The widths of the transitional region are found to be within 4 monolayers for the interface between oxidized AlAs and unoxidized GaAs and 6.5 nm for the one between oxidized and unoxidized AlAs. The oxide layer thickness is found to decrease gradually from the oxidation front over a length of 200 nm. (C) 1996 American Institute of Physics.
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页码:659 / 661
页数:3
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