Electrostatically driven microgripper

被引:109
作者
Volland, BE [1 ]
Heerlein, H [1 ]
Rangelow, IW [1 ]
机构
[1] Univ Kassel, Inst Technol Phys, D-34132 Kassel, Germany
关键词
MEMS; actuators; grippers; micromachining; deep silicon etching;
D O I
10.1016/S0167-9317(02)00461-6
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work we report on microactuators and microgrippers fabricated from SOI (silicon-on-insulator) wafers by a surface and bulk micromachining fabrication technology. The main advantages of this technology are: (a) large thickness of the devices (10-40 mum) resulting in devices which are stable against disturbing forces perpendicular (z-direction) to the ground plate; (b) the small number of fabrication steps required. Only three steps are required: lithography, trench etching of silicon, and release of movable parts (selective wet etching of the buried oxide layer). The linear motion ('pull action') of the microactuator is converted into a rotational gripping motion by a system of elastic spring beams. At a voltage of 90 V, the gripper tweezers are closed. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:1015 / 1023
页数:9
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