The anisotropic distribution of dislocations and tilts in metamorphic GaInAs/AlInAs buffers grown on GaAs substrates with miscut angles toward (111)A

被引:9
作者
Sun, Yurun [1 ,2 ]
Li, Kuilong [1 ,2 ]
Dong, Jianrong [1 ]
Zeng, Xulu [1 ,2 ]
Yu, Shuzhen [1 ]
Zhao, Yongming [1 ]
Zhao, Chunyu [1 ]
Yang, Hui [1 ]
机构
[1] Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion, Key Lab Nanodevices & Applicat, Suzhou 215123, Peoples R China
[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
基金
中国国家自然科学基金;
关键词
Semiconductor; Tilt; Anisotropy; Dislocations; X-ray diffraction; STRAIN RELAXATION; INP; MISORIENTATION; LAYERS;
D O I
10.1016/j.jallcom.2014.01.206
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The metamorphic GaInAs/AlInAs buffers grown by metal organic chemical vapor deposition (MOCVD) on GaAs substrates with miscut angles toward (111) A exhibit anisotropic properties in the two < 110 > directions. A higher dislocation density is observed along [110] direction for samples with substrate miscuts of 2 degrees and 7 degrees, while along [1 - 10] direction for samples with a substrate miscut of 15 degrees. The different nucleation energies and glide velocities of alpha and beta dislocations contribute to the anisotropic dislocation distribution for the 2 degrees and 7 degrees samples, however, the unequal resolved shear stress (RSS) distribution between different slip systems introduced by the miscut is responsible for the 15 degrees sample. A modified model is proposed to determine the tilt angle of epilayer with respect to the substrates, and the results show that different tilt angles in the two < 110 > directions is mainly attributed to the different strain relaxation in two < 110 > directions caused by the miscut toward (111)A. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码:45 / 49
页数:5
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