Modifying the nanocrystalline characteristics-structure, size, and surface states of copper oxide thin films by high-energy heavy-ion irradiation

被引:121
作者
Balamurugan, B
Mehta, BR [1 ]
Avasthi, DK
Singh, F
Arora, AK
Rajalakshmi, M
Raghavan, G
Tyagi, AK
Shivaprasad, SM
机构
[1] Indian Inst Technol, Dept Phys, Thin Film Lab, New Delhi 110016, India
[2] Ctr Nucl Sci, New Delhi 110067, India
[3] Indira Gandhi Ctr Atom Res, Div Mat Sci, Kalpakkam 603102, Tamil Nadu, India
[4] Natl Phys Lab, Surface Phys Grp, New Delhi 110012, India
关键词
D O I
10.1063/1.1499752
中图分类号
O59 [应用物理学];
学科分类号
摘要
In the present study, x-ray diffraction, Raman spectroscopy, spectroscopic ellipsometry, photoluminescence, and x-ray photoelectron spectroscopy techniques were used to study the effect of 120 MeV Ag-107(9+) ion irradiation on nanocrystalline Cu2O thin films grown by the activated reactive evaporation technique. The influence of dense electronic excitations during ion irradiation on the structural and optical properties of the Cu2O thin films was studied. Experimental results demonstrate that the phase and the size of nanocrystallites in the Cu2O thin films as well as associated surface states can be tailored by controlling ion fluence. The Cu2O higher symmetry cubic phase is observed to be quite stable under a higher temperature and irradiation-induced thermal spikes, which accompanies ion irradiation. (C) 2002 American Institute of Physics.
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收藏
页码:3304 / 3310
页数:7
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