ORC and LfD as First Steps towards DfM

被引：3

作者：

Maerz, Reinhard ^{[1
]}

Peter, Kai ^{[1
]}

Maurer, Wilhelm ^{[1
]}

机构：

[1] Infineon Technol AG, Munich, Germany

来源：

EMLC 2006: 22ND EUROPEAN MASK AND LITHOGRAPHY CONFERENCE | 2006年 / 6281卷

关键词：

D O I：

10.1117/12.692641

中图分类号：

TB8 [摄影技术];

学科分类号：

0804 ;

摘要：

The role the Optical Rule Check (ORC) in the design flow and future directions are discussed, the benefit of the model-based methodology is illustrated by using realistic layout situations. Concepts for implementation of Litho-friendly Design (LfD), i.e., of layout optimization and lithography simulations in the pre-tapeout design flow are developed.

引用

页数：6