Deposition of titanium nitride on Si(100) wafers using plasma focus

被引：37

作者：

Hussain, Tousif ^{[1
]}

Ahmad, R. ^{[1
]}

Khan, I. A. ^{[1
]}

Siddiqui, Jamil ^{[1
]}

Khalid, Nida ^{[1
]}

Bhatti, Arshad Saleem ^{[2
]}

Naseem, Shahzad ^{[3
]}

机构：

[1] Govt Coll Univ, Dept Phys, Lahore 54000, Pakistan

[2] COMSATS, Islamabad, Pakistan

[3] Univ Punjab, Ctr Solid State Phys, Lahore, Pakistan

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2009年 / 267卷 / 05期

关键词：

TiN thin films; DPF; XRD; SEM; AFM; NANOCRYSTALLINE COMPOSITE-MATERIALS; CHEMICAL-VAPOR-DEPOSITION; SI-N COATINGS; THIN-FILMS; HARD COATINGS; MECHANICAL-PROPERTIES; NANOCOMPOSITE FILMS; LOW-TEMPERATURE; TIN FILMS; BEHAVIOR;

D O I：

10.1016/j.nimb.2009.01.008

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Titanium nitride thin films were deposited on Si(100) substrates by using a low energy (2.3 KJ) Mather-type plasma focus device. The composition of the deposited films was characterized by X-ray diffraction (XRD). The crystallite size has strong dependence on the numbers of focus shots. The crystallinity of TiN thin films is found to increase with increasing the number of focus shots. The effect of different number of focus shots on micro structural changes of thin films was characterized by Scanning Electron Microscope (SEM) and Atomic Force Microscope (AFM). SEM results showed net-like structure for film deposited for 15 numbers of shots, which are elongated grains of Si3N4 in amorphous form embedded into TiN crystals. The average surface roughness was calculated from AFM images of the thin films. These results indicated that the average surface roughness increased for films deposited with increased number of focus shots. The least crystallite size and roughness are observed for film deposited with 25 focus shots. (C) 2009 Elsevier B.V. All rights reserved.

引用

页码：768 / 772

页数：5

共 43 条

[1] MASS AND ENERGY ANALYSIS AND SPACE-RESOLVED MEASUREMENTS OF IONS FROM PLASMA-FOCUS DEVICES [J].