Micropatterning of block copolymer solutions

被引：35

作者：

Deng, T ^{[1
]}

Ha, YH ^{[1
]}

Cheng, JY ^{[1
]}

Ross, CA ^{[1
]}

Thomas, EL ^{[1
]}

机构：

[1] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA

来源：

LANGMUIR | 2002年 / 18卷 / 18期

关键词：

D O I：

10.1021/la020446o

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Submicron patterns of block copolymers were generated using an elastomeric mold against solutions of block copolymers. To prevent the swelling of the elastomeric mold by the solvent used in the block copolymer solution, a thin layer of amorphous fluorinated polymer was coated on the surface of the mold. The comparison of patterns generated using an unmodified mold with those generated using a modified mold is also reported. Coupled with their microphase separation at nanometer scale, these block copolymer patterns can be applied in nanofabrication as nanotemplates.

引用

页码：6719 / 6722

页数：4

共 22 条

[1]

Cheng JY, 2001, ADV MATER, V13, P1174, DOI 10.1002/1521-4095(200108)13:15<1174::AID-ADMA1174>3.0.CO

[2]

2-Q

[3]

CHENG JY, 2002, UNPUB

[4]

Edrington AC, 2001, ADV MATER, V13, P421, DOI 10.1002/1521-4095(200103)13:6<421::AID-ADMA421>3.0.CO

[5]

2-#

[6]

Fichet G, 2002, ADV MATER, V14, P47, DOI 10.1002/1521-4095(20020104)14:1<47::AID-ADMA47>3.0.CO

[7]

2-2

[8] Block copolymers as photonic bandgap materials [J].

Fink, Y ;

Urbas, AM ;

Bawendi, MG ;

Joannopoulos, JD ;

Thomas, EL .

JOURNAL OF LIGHTWAVE TECHNOLOGY, 1999, 17 (11) :1963-1969

[9] Lithography with a mask of block copolymer microstructures [J].

Harrison, C ;

Park, M ;

Chaikin, PM ;

Adamson, DH .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (02) :544-552

[10] Fabrication of regularly arranged nanocolumns on diamond(100) using micellar masks [J].

Koslowski, B ;

Strobel, S ;

Herzog, T ;

Heinz, B ;

Boyen, HG ;

Notz, R ;

Ziemann, P ;

Spatz, JP ;

Möller, M .

JOURNAL OF APPLIED PHYSICS, 2000, 87 (10) :7533-7538

← 1 2 3 →