Large-Area Dual-Scale Metal Transfer by Adhesive Force

被引:34
作者
Kwak, Moon Kyu [1 ]
Kim, Tae-il [2 ]
Kim, Pilnam [1 ]
Lee, Hong H. [2 ]
Suh, Kahp Y. [1 ]
机构
[1] Seoul Natl Univ, Sch Mech & Aerosp Engn, Inst Adv Machinery & Design, Seoul 151742, South Korea
[2] Seoul Natl Univ, Sch Chem & Biol Engn, Seoul 151742, South Korea
关键词
adhesion; metal transfer; pattern transfer; polarizers; LIGHT-EMITTING-DIODES; NANOIMPRINT LITHOGRAPHY; NANOLITHOGRAPHY; FABRICATION;
D O I
10.1002/smll.200801262
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
A study was conducted to demonstrate a dual-scale metal transfer from the ridge and valley parts of a mold by utilizing a difference in adhesive force. This dual-scale patterning allowed for metal patterns of two different length scales from a single master, significantly reducing process complexity and costs involved in preparing a master. A polyurethane acrylate (PUA) mold was replicated from a silicon master by replica molding for the investigations. A thin metal layer was deposited on the PUA mold using a thermal evaporator with a layer thickness of 20-200nm. A thin and flat Norland Optical Adhesive (NOA) 71 layer was spin-coated on a clean Pyrex wafer as an adhesive layer and attached to a poly(ethylene terephthalate) (PET) support to transfer a metal layer from the ridges of the mold. A metal was also deposited with a relatively high deposition rate by a thermal evaporator, giving rise to voids within the valleys and upon removal of the mold.
引用
收藏
页码:928 / 932
页数:5
相关论文
共 25 条
[1]   Additive soft-lithographic patterning of submicrometer- and nanometer-scale large-area resists on electronic materials [J].
Ahn, H ;
Lee, KJ ;
Shim, A ;
Rogers, JA ;
Nuzzo, RG .
NANO LETTERS, 2005, 5 (12) :2533-2537
[2]   Micron and submicron patterning of polydimethylsiloxane resists on electronic materials by decal transfer lithography and reactive ion-beam etching: Application to the fabrication of high-mobility, thin-film transistors [J].
Ahn, Heejoon ;
Lee, Keon Jae ;
Childs, William R. ;
Rogers, John A. ;
Nuzzo, Ralph G. ;
Shim, Anne .
JOURNAL OF APPLIED PHYSICS, 2006, 100 (08)
[3]   Fabrication of subwavelength aluminum wire grating using nanoimprint lithography and reactive ion etching [J].
Ahn, SW ;
Lee, KD ;
Kim, JS ;
Kim, SH ;
Lee, SH ;
Park, JD ;
Yoon, PW .
MICROELECTRONIC ENGINEERING, 2005, 78-79 :314-318
[4]  
ALEXANDER B, 2000, AIP, V88, P4310
[5]   Large-area patterning of coinage-metal thin films using decal transfer lithography [J].
Childs, WR ;
Nuzzo, RG .
LANGMUIR, 2005, 21 (01) :195-202
[6]   Decal transfer microlithography: A new soft-lithographic patterning method [J].
Childs, WR ;
Nuzzo, RG .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2002, 124 (45) :13583-13596
[7]   Simple detachment patterning of organic layers and its application to organic light-emitting diodes [J].
Choi, JH ;
Kim, D ;
Yoo, PJ ;
Lee, HH .
ADVANCED MATERIALS, 2005, 17 (02) :166-+
[8]   Whole device printing for full colour displays with organic light emitting diodes [J].
Choi, Jun-Ho ;
Kim, Kyung-Ho ;
Choi, Se-Jin ;
Lee, Hong H. .
NANOTECHNOLOGY, 2006, 17 (09) :2246-2249
[9]   Sub-10 nm imprint lithography and applications [J].
Chou, SY ;
Krauss, PR ;
Zhang, W ;
Guo, LJ ;
Zhuang, L .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (06) :2897-2904
[10]   Nanoimprint lithography [J].
Chou, SY ;
Krauss, PR ;
Renstrom, PJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06) :4129-4133