Influence of substrates on magnetic property and crystalline orientation of CoCrTa/TiCr perpendicular magnetic recording medium

被引:5
作者
Asahi, T
Ikeda, M
Takizawa, A
Onoue, T
Osaka, T
机构
[1] Waseda Univ, Kagami Mem Lab Mat Sci & Technol, Shinjuku Ku, Tokyo 1690051, Japan
[2] Waseda Univ, Sch Sci & Engn, Dept Appl Chem, Shinjuku Ku, Tokyo 1698555, Japan
基金
日本学术振兴会;
关键词
thin films; perpendicular magnetic recording medium; effect of kind of substrate; pretreatment to surface of substrate;
D O I
10.1016/S0304-8853(99)00774-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The influence of substrates on magnetic property and crystalline orientation of CoCrTa/TiCr perpendicular magnetic recording medium was investigated using a glass plate and a Si(1 0 0) single crystal. Magnetic measurements revealed that the film sputtered on a Si(1 0 0) substrate possessed a higher perpendicular coercive force than that on glass, where the pretreatment of the Si(1 0 0) substrate by aqueous HF solution effectively improved the magnetic properties. X-ray diffraction analysis of the films indicated that the crystallinity of the TiCr layer formed on the Si(1 0 0) substrate with the HF pretreatment was higher than that on the glass substrate. It was also found that CoCrTa and TiCr layers on the Si(1 0 0) substrate with the KF pretreatment had a narrower distribution of their c-axis orientation than those on glass substrate. The results of X-ray diffraction analysis were consistent with those of the TEM observation for cross-section bright- and dark-field images and the corresponding THEED patterns. These results suggest that the crystalline surface of the Si(1 0 0) substrate with HF pretreatment has the effect of inducing preferred orientation in the TiCr underlayer, which leads to a decrease in distribution of the c-axis orientation of Co grains in the CoCrTa layer, resulting in an increase in the perpendicular coercive force. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:293 / 299
页数:7
相关论文
共 14 条
[11]   A soft magnetic CoNiFe film with high saturation magnetic flux density and low coercivity [J].
Osaka, T ;
Takai, M ;
Hayashi, K ;
Ohashi, K ;
Saito, M ;
Yamada, K .
NATURE, 1998, 392 (6678) :796-798
[12]  
OSAKA T, 1997, J MAGN SOC JPN, V21, P213
[13]  
Yoda H, 1996, IEEE T MAGN, V32, P3363, DOI 10.1109/20.538627
[14]  
YOGI T, 1991, J MAGN SOC JPN, V15, P475